Gerard T. Luk Pat: search on Z-Library

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1

High-resolution three-dimensional in vivo imaging of atherosclerotic plaque

Gerard T. Luk-Pat, Garry E. Gold, Eric W. Olcott, Bob S. Hu, Dwight G. Nishimura

Journal:

Magnetic Resonance in Medicine

Year:

1999

Language:

english

File:

PDF, 283 KB

english, 1999

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Design for Manufacturability through Design-Process Integration VI - Implications of triple patterning for 14nm node design and patterning

Lucas, Kevin, Cork, Chris, Yu, Bei, Luk-Pat, Gerard, Painter, Ben, Pan, David Z., Mason, Mark E.

Year:

2012

Language:

english

File:

PDF, 1.63 MB

english, 2012

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Design-Process-Technology Co-optimization for Manufacturability IX - Layout optimization with assist features placement by model based rule tables for 2x node random contact

Sturtevant, John L., Capodieci, Luigi, Jun, Jinhyuck, Park, Minwoo, Park, Chanha, Yang, Hyunjo, Yim, Donggyu, Do, Munhoe, Lee, Dongchan, Kim, Taehoon, Choi, Junghoe, Luk-Pat, Gerard, Miloslavsky, Alex

Year:

2015

Language:

english

File:

PDF, 1013 KB

english, 2015

4

Reducing off-resonance distortion by echo-time interpolation

Gerard T. Luk-Pat, Dwight G. Nishimura

Journal:

Magnetic Resonance in Medicine

Year:

2001

Language:

english

File:

PDF, 239 KB

english, 2001

5

Reducing flow artifacts in echo-planar imaging

Gerard T. Luk Pat, Craig H. Meyer, John M. Pauly, Dwight G. Nishimura

Journal:

Magnetic Resonance in Medicine

Year:

1997

Language:

english

File:

PDF, 1.17 MB

english, 1997

6

One-shot spatially resolved velocity imaging

Gerard T. Luk Pat, John M. Pauly, Bob S. Hu, Dwight G. Nishimura

Journal:

Magnetic Resonance in Medicine

Year:

1998

Language:

english

File:

PDF, 1.05 MB

english, 1998

7

[IEEE 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - San Jose, CA, USA (2013.11.18-2013.11.21)] 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - A high-performance triple patterning layout decomposer with balanced density

Yu, Bei, Lin, Yen-Hung, Luk-Pat, Gerard, Ding, Duo, Lucas, Kevin, Pan, David Z.

Year:

2013

Language:

english

File:

PDF, 932 KB

english, 2013

8

[ACM Press the 50th Annual Design Automation Conference - Austin, Texas (2013.05.29-2013.06.07)] Proceedings of the 50th Annual Design Automation Conference on - DAC '13 - Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Du, Yuelin, Ma, Qiang, Song, Hua, Shiely, James, Luk-Pat, Gerard, Miloslavsky, Alexander, Wong, Martin D. F.

Year:

2013

Language:

english

File:

PDF, 1.54 MB

english, 2013

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Avoiding wafer-print artifacts in spacer is dielectric (SID) patterning

Luk-Pat, Gerard, Conley, Will, Painter, Ben, Miloslavsky, Alex, De Bisschop, Peter, Beacham, Adam, Lucas, Kevin

Year:

2013

Language:

english

File:

PDF, 854 KB

english, 2013

10

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Printability verification for double-patterning technology

Luk-Pat, Gerard, Kawahira, Hiroichi, Zurbrick, Larry S., Panaite, Petrisor, Lucas, Kevin, Cork, Christopher, Wiaux, Vincent, Verhaegen, Staf, Maenhoudt, Mireille

Year:

2008

Language:

english

File:

PDF, 1.27 MB

english, 2008

11

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Probabilistic calibration of a simple resist model for simulation-based scoring of mask defects

Luk-Pat, Gerard T., Archie, Chas N., Kondepudy, Raghava V., Du, Robert, Morgan, Ray E.

Year:

2006

Language:

english

File:

PDF, 332 KB

english, 2006

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Design compliance for spacer is dielectric (SID) patterning

Luk-Pat, Gerard, Miloslavsky, Alex, Painter, Ben, Lin, Li, De Bisschop, Peter, Lucas, Kevin, Conley, Will

Year:

2012

Language:

english

File:

PDF, 1.86 MB

english, 2012

13

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Correcting lithography hot spots during physical-design implementation

Luk-Pat, Gerard T., Martin, Patrick M., Naber, Robert J., Miloslavsky, Alexander, Ikeuchi, Atsuhiko, Suzuki, Hiroaki, Kyoh, Suigen, Izuha, Kyoko, Tseng, Frank, Wen, Linni

Year:

2006

Language:

english

File:

PDF, 297 KB

english, 2006

14

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Assist feature aware double patterning decomposition

Cork, Christopher, Kawahira, Hiroichi, Zurbrick, Larry S., Barnes, Levi, Luk-Pat, Gerard

Year:

2008

Language:

english

File:

PDF, 8.29 MB

english, 2008

15

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Photomask quality assessment solution for 90-nm technology node

Ohira, Katsumi, Tanabe, Hiroyoshi, Chung, Dong Hoon P., Nobuyuki, Yoshioka, Tateno, Motonari, Matsumura, Kenichi, Chen, Jiunn-Hung, Luk-Pat, Gerard T., Fukui, Norio, Tanaka, Yoshio

Year:

2004

Language:

english

File:

PDF, 482 KB

english, 2004

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Process window and integration results for full-chip model-based assist-feature placement at the 32 nm node and below

Li, Ji, Dusa, Mircea V., Conley, Will, Luk-Pat, Gerard, Poonawala, Amyn, Lucas, Kevin, Painter, Ben

Year:

2010

Language:

english

File:

PDF, 2.05 MB

english, 2010

17

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Simulation-based Defect Printability Analysis on Alternating Phase Shifting Masks for 193nm Lithography

Pang, Linyong, Yu, Zongchang, Luk-Pat, Gerard T., Chen, Jerry X., Volk, William, Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 700 KB

english, 2002

18

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Study of Defect Printability Analysis on Alternating Phase Shifting Masks for 193 nm Lithography

Morikawa, Yasutaka, Grenon, Brian J., Kimmel, Kurt R., Totsu, Yousuke, Nishiguchi, Masaharu, Hoga, Morihisa, Hayashi, Naoya, Pang, Linyong, Luk-Pat, Gerard T.

Year:

2002

Language:

english

File:

PDF, 840 KB

english, 2002